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Honorary Professorship Nanoelectronics Technologies
Publications
Honorary Professorship Nanoelectronics Technologies 

Publications

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Year 2020

A.Preuss; S.Notz; E.Kovalski; M.Korb; Blaudeck,T.; Hu,X.; Schuster,J.; D.Miesel; T.Rueffer; A.Hildebrandt; K.Schreiter; S.Spange; Schulz,S.E.; H.Lang: Ferrocenyl-Pyrenes, Ferrocenyl-9,10-Phenanthrenediones, and Ferrocenyl-9,10-Dimethoxyphenanthrenes:Charge-Transfer Studies and SWCNT Functionalization. Chem. Eur.J., 26, 12 (2020) p 2635 –2652 (ISSN 1521-3765)
A.Preuss; S.Notz; E.Kovalski; M.Korb; Blaudeck,T.; Hu,X.; Schuster,J.; D.Miesel; T.Rueffer; A.Hildebrandt; K.Schreiter; S.Spange; Schulz,S.E.; H.Lang: Cover Feature: Ferrocenyl‐Pyrenes, Ferrocenyl‐9,10‐Phenanthrenediones, and Ferrocenyl‐9,10‐Dimethoxyphenanthrenes: Charge‐Transfer Studies and SWCNT Functionalization (Chem. Eur. J. 12/2020). Chem. Eur. J., 26, 12 (2020) pp 2518-2518 (ISSN 1521-3765)
Almeida,M.; Sharma,A.; Matthes,P.; Okano,S.; Hellwig,O.; Ecke,R.; Zahn,D.R.T.; Salvan,G.; Schulz,S.E.: Spectroscopic ellipsometry and magneto-optical Kerr effect spectroscopy study of thermally treated Co60Fe20B20 thin films . J. Phys.: Condens. Matter , 32 (2020) p 055702
Franz,M.; Junghans,R.; Schmitt,P.; Szeghalmi,A.; Schulz,S.E.: Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir. Beilstein Journal of Nanotechnology, 11 (2020) pp 1439-1449 (ISSN 2190-4286)
Haase,M.; Melzer,M.; Lang,N.; Ecke,R.; Zimmermann,S.; van Helden,J.-P.H.; Schulz,S.E.: On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes. AIP Advances, 10 (2020) p 065212
Hartmann,M.; Tittmann-Otto,J.; Boettger,S.; Heinrich,K.; Heldt,G.; Claus,M.; Schulz,S.E.; Schroeter,M.; Hermann,S.: Gate Spacer Investigation for Improving the Speed of High-Frequency Carbon Nanotube-Based Field-Effect Transistors. ACS Applied Materials and Interfaces, 12, 24 (2020) p 27461–27466
Hu,X.; Schuster,J.; Schulz,S.E.: Ab initio study on the surface reactions of thermal atomic layer etching of Al2O3. The AVS 20th International Conference on Atomic Layer Deposition (ALD 2020), Belgium, 2020 Jul 31
Kiani,M.; Du,N.; Vogel,M.; Raff,J.; Huebner,U.; Skorupa,I.; Buerger,D.; Schulz,S.E.; Schmidt,O.G.; Blaschke,D.; Schmidt,H.: Disturbing-Free Determination of Yeast Concentration in DI Water and in Glucose Using Impedance Biochips. Biosensors, 10, 1 (2020) p 7
Preuss,A.; Tamuliene,J.; Madajska,K.; Szymanska,I.B.; Korb,M.; Rueffer,T.; Jeschke,J.; Melzer,M.; Bankwitz,J.; Schulz,S.E.; Lang,H.: Ruthenium(II) MOCVD Precursors for Phosphorus‐Doped Ruthenium Layer Formation. Eur. J. Inorg. Chem., pp 1612-1623
Ramasubramanian,L.; Kakay,A.; Fowley,C.; Yildirim,O.; Matthes,P.; Sorokin,S.; Titova,A.; Hilliard,D.; Boettger,R.; Huebner,R.; Gemming,S.; Schulz,S.E.; Makarov,D.; Fassbender,; Deac,A.: Tunable Magnetic Vortex Dynamics in Ion-Implanted Permalloy Disks. ACS Applied Materials & Interfaces, 12, 24 (2020) p 27812–27818
Rayapati,V.; Buerger,D.; Du,N.; Kowol,C.; Blaschke,D.; Stoecker,H.; Matthes,P.; Patra,R.; Skorupa,I.; Schulz,S.E.; Schmidt,H.: Charged domains in ferroelectric, polycrystalline yttrium manganite thin films resolved with scanning electron microscopy. Nanotechnology, 31 (2020) p 31LT01
Rizzi,L.; Schuster,J.; Koehne,M.; Schulz,S.E.:NanoNet Annual Workshop 2020, Altenberg, 2020 Oct 07-09
Rizzi,L.; Wijaya,A.F.; Palanisamy,L.V.; Schuster,J.; Koehne,M.; Schulz,S.E.: Quantifying the influence of graphene film nanostructure on the macroscopic electrical conductivity. Nano Express, 1, 2 (2020) p 020035
Sharma,A.; Almeida Hoffmann,M.; Matthes,P.; Hellwig,O.; Kowol,C.; Schulz,S.E.; Zahn,D.R.T.; Salvan,G.: Crystallisation of optically thick films of CoxFe(80-x)B20: evolution of the (magneto-) optical and structural properties. Phys. Rev. B, 101 (2020) pp 054438-
Sharma,A.; Matthes,P.; Soldatov,I.; Arekapudi,S.S.P.K.; Boehm,B.; Lindner,M.; Selyshchev,O.; Ha,N.T.N.; Mehring,M.; Tegenkamp,C.; Schulz,S.E.; Zahn,D.R.T.; Paltiel,Y.; Hellwig,O.; Salvan,G.: Control of magneto-optical properties of cobalt-layers by adsorption of α-helical polyalanine self-assembled monolayers. J. Mater. Chem. C, 8 (2020) pp 11822-11829