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Successful workshop for atomically precise surface technologies in Chemnitz

Young scientists benefit from the exchange within the innovation network for atomic layer processing ALPIN

On September 11 and 12, 2023, the third workshop of the Atomic Layer Process Innovation Network (ALPIN) took place at the Chemnitz University of Technology. More than 80 experts from all over Germany were present - a new record for ALPIN! The central idea of the ALPIN workshops is to establish a low-threshold offer for young scientists in addition to the partly cost-intensive conferences. The main focus are the presentation of current research and the networking with established researchers and industry representatives. To make this possible, it was again possible this year to cover all costs incurred through support from the university and sponsorship from industrial partners, so that no workshop fees were charged.

Atomic layer processing is an advanced technology to deposit thin films of few atoms thickness conformal or to remove them precisely. This technology plays an important role in semiconductor industry, in photonics, and for example to seal surfaces. Accordingly, the workshop benefited from the variety of specialist contributions in the form of posters and talks. The participants presented research in new materials, processes, and the applications of atomic layer processes.

Germany and Saxony in particular, is globally one of the most important location for research in atomic layer processing. Accordingly, many participants belong to research institutes and universities of Saxony. The hosts of the University of Technology Chemnitz and the Fraunhofer Institute for Electronic Nano Systems were present with four research groups. The simulation team of the Center for Microtechnologies of the TU Chemnitz (Linda Jäckel, Dr. Xiao Hu, Dr. Jörg Schuster) presented current works of the modelling of atomically precise etching of materials of the semiconductor technology. Various potential materials are investigated with quantum chemical simulations on high-performance computers to identify promising candidates for experimental tests. The technology team of the Fraunhofer ENAS (Dr. Lysann Kaßner and Mathias Franz) presented current results on the atomic layer deposition of metallic cobalt. Two research groups from the Institute of Chemistry of the TU Chemnitz were at the workshop and presented research works on the coating of carbon fibres with titanium phosphate (Martin Klapper and Prof. Dr. Werner Goedel, Physical Chemistry), and the synthesis of novel precursors as starting material for the atomic layer deposition (Prof. Dr. Robert Kretschmer, Inorganic Chemistry).

Links to recent publications of the Chemnitz scientists in scientific journals:

Xiao Hu, Jörg Schuster, Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study, J. Phys. Chem. C 2022, 126, 17, 7410–7420

Oleksandr Kysliak, Simon H. F. Schreiner, Niklas Grabicki, Phil Liebing, Florian Weigend, Oliver Dumele, Robert Kretschmer, A Planar Five-Membered Aromatic Ring Stabilized by Only Two π-Electrons, Angew. Chem Int. Ed. 2022

Pauline Dill, Xiang Ren, Helen Hintersatz, Mathias Franz, Doreen Dentel, Christoph Tegenkamp, Susann Ebert,  Atomic Layer Deposition of Titanium Phosphate onto Reinforcing Fibers Using Titanium Tetrachloride, Water, and Tris(Trimethylsilyl) Phosphate as Precursors. Journal of Vacuum Science & Technology A 2022, 40 (2), 022403.

(Author: Dr. Jörg Schuster)

Mario Steinebach

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