Technical Equipment
Composites
Physical vapor deposition (PVD)
Device: DC magnetron sputtering system B30.2 TSP
Specifications:
- DC magnetron sputtering system B30.2 TSP
- Sputter source 1: TruPlasma DC 3002 - 2.0 kW
- Sputter source 2: MagPuls DC generator 1.0 kW with bipolar pulse unit MP2 - 20 bp
- Magnetron INO’X – 3‘‘
- Target diameter: 3‘‘ / 76,2 mm
- Max. Base pressure 1*10-6 mbar
- Process gas: Ar6.0
- Reactive gases N2, O2
- Substrate heating up to 650 °C
- Rotation unit for coating fibers and wires
Applications:
- Deposition of thin amorphous and crystalline solid layers
- Coating of metals, ceramics, glasses and plastics
- Coating of flat substrates as well as single fibers
- Monolayer and multilayer layers made of metals, oxides and nitrides
- Deposition of sensor, insulation and contact layers
Contact Person
Dr.-Ing. Maik Trautmann
- Telefon:+49 371 531-38846
- Fax:+49 371 531-838846
- Raum:3, 3/A104
- E-Mail:
