Services
composites
Chemical Vapour Deposition (CVD)
- Thermal and plasma-enhanced pretreatment and coating of substrates
- Production of mono- and multilayer coatings
- Substrates: fibers, wires, platelets, max. Ø: 80 mm
- Layers: Boron nitride, silicon nitride, yttrium oxide, ...
- Process gases: O2, N2, NH3, CH4,, silane, diborane
- Temperature: max. 1000 °C
- Pressure range: 0.5 - 20 mbar
Weiterführende Informationen
Ansprechpartner
Dr.-Ing. Maik Trautmann
- Telefon:+49 371 531-38846
- Fax:+49 371 531-838846
- Raum:3, 3/A104
- E-Mail:
