Experimental infrastructure

Thin-film deposition

Sputter chamber AJA ATC 2200-V

7 confocal sputter guns (2x RF possible) temperature range: 200-1000 K UHV, sample rotation Substrate sputter option  Load lock option

Sputter chamber B55

• 4 sputter guns
• temperature range: upto 975 K
• HV, sample rotation

Magnetic charactrization

Quantum Design MPMS (Magnetic Property Measurement System) SQUID-VSM

high sensitivity to magnetic moment susceptibility measurement option maximum magnetic field: 7 T temperature range: 1.8 K - 1000 K

NanoScan High Resolution Magnetic Force Microscope (in-field)

0.5 Tesla (out-of-plane geometry) High SNR vacuum tool Constant height mode

Oxford Instruments CF1200 Continuous Flow Cryostat

• 5 Tesla (in and out-of-plane geometry)
• temperature range: 4.5 K-300 K

Structural characterization

X-ray Diffractometer Rigaku SmartLab

9 kW rotating anode X-ray source Bragg-Brentano and Parallel beam geometry 2D detector system In-plane arm easily interchangeable optic components

Access to FEI Nova NanoSEM 200 Scanning Electron Microscopy (SEM)

Note: Additionally, we also have full access to sputter tool, Magneto Optical Kerr Effect, AFM/MFM and (Vector-)VSM at Helmholtz-Zentrum Dresden-Rossendorf (HZDR).