Optical Spectroscopy
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Figure 1: Scanning electron microscopy image of Ag nanostructures on a silicon substrate. 450 nm particles were used as a deposition mask. Nanosphere lithography is a versatile tool to fabricate plasmonic structures. The picture shows a scanning electron microscopy image of the resulting nanostructures. These nanostructures show a strong plasmonic effect. |
Figure 2: Ellipsometric Delta contrast image of periodic Au nanostructures on Si substrate recorded with an Accurion EP3-SE imaging ellipsometer (image courtesy of C. Röling, Accurion GmbH). The inset shows a typical SEM image of 400 nm2 of an Au array with a 130 nm period. On the left side the effective and modeled extinction coefficient for the region 6 are plotted. |
Figure 3: Schematic drawing of the combination of the Dilor XY 800 Raman Spectrometer with an UHV chamber. This offers the opportunity to acquire Raman spectra during evaporation or during high temperature treatment under ultra-high vacuum conditions. |
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P. Tonndorf, R. Schmidt, P. Böttger, X. Zhang, J. Börner, A. Liebig, M. Albrecht, C. Kloc, O. Gordan, D.R.T. Zahn, S. Michaelis de Vasconellos, R. Bratschitsch T. Ebert, G. Cox, E. Sheremet, O. Gordan, D.R.T. Zahn, F. Simon, S. Spange F. Haidu, O. Gordan, D.R.T. Zahn F. Seidel, L. Ding, O. Gordan, D.R.T. Zahn M. Ludemann, Iulia E. Brumboiu, O. Gordan, D.R.T Zahn F. Haidu, M. Fronk, O. Gordan, G. Salvan, D.R.T. Zahn |
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