Development of an inline quality assurance technology on basis S2S and R2R for printed patterned layers
ZIM FKZ: ZF4273103WO7
|Duration:||01.03.2018 - 31.08.2020|
Department of Digital Printing and Imaging Technology, TU Chemnitz
Konkuk University (Korea)
Hochschule Mittweida (Germany)
Miru Systems Co., Ltd. (Korea)
Toba Co., Ltd. (Korea)
GT+W GmbH (Germany)
Mauerer Services GmbH (Germany)
This project aims to develop an inline quality assurance technology for conductive patterns which is based on optical inspection, inkjet material deposition and laser scribing techniques. This process will be developed for moving samples that are either sheet (S2S - sheet to sheet) or web (R2R - roll-to-roll) based. The interaction process is the same in both bases - only the handling of the sample is different.
In printed electronics applications the conductivity of patterend layers might fail by missing or surplus material deposition, respectively. Analyzing and detecting deviations from the target pattern, an optimization is done by digital interaction technologies: inkjet printing of conductive inks or removing patterned material by laser ablation.
The result is to maximize the output yield of the printing process.
Kalyan Yoti Mitra
Reinhard R. Baumann