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Materialsysteme der Nanoelektronik


  • D.G. Cahill, University of Illinois at Urbana-Champaign, USA
    TDTR: Time-Domain Thermo-Reflectance measurement of hybrid superlattice structures
  • R. Wördenweber, Forschungszentrum Jülich, Germany
    Superconductivity: Measurement and deposition
  • Institute for Solid State Research, IFW Dresden, Germany
    Electron beam lithography (R. Giraud) and superconductors (V. Katsaev)
  • Institute of Complex Materials, IFW Dresden, Germany
    TEM (M.H. Rümmeli), magnetic nanoparticles (T. Woodcock), magnetic force microscopy (V. Neu)
  • Murata Manufacturing Co., Ltd.
  • A.-D. Müller, Anfatec Instruments AG, Oelsnitz/Vogtland, Germany
    Kelvin Force Microscopy
  • K. Szielasko/M. Rabung, IZFP Saarbrücken, Saarbrücken, Germany
    Electromagnetic inspection
  • R. Ecke/S. E. Schulz, Fraunhofer ENAS, Chemnitz, Germany
    CMOS-compatible processing
  • S. Barth/H. Bartzsch, Fraunhofer FEP, Dresden, Germany
    Upscaling thin film technologies
  • F. Kienberger, Agilent Labs Linz, Linz, Austria
    Scanning Microwave Microscopy
  • A. Kolitsch, HZDR Innovation GmbH, Dresden, Germany
    Ion implantation
  • Dr. Lars Giebeler und Dr. Steffen Oswald, IKM Dresden, Dresden, Germany

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