- Author(s):
- C. Murray, C. Flannery, I. Streiter, S.E. Schulz, M.R. Baklanov, K.P. Mogilnikov, C. Himcinschi, M. Friedrich, D.R.T. Zahn, T. Geßner
Source:- Microelectronic Engineering 60 (2002) 133
Title:- Comparison of Techniques to Characterise the Density, Porosity and Elastic Modulus of Porous Low-k SiO2 Xerogel Films
Abstract: (visitor access)- /physik/HLPH/publications/p_src/357a.pdf
Type of Publication:- Refereed Journal
Year:- 2002
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